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Jassem Abdallah
Jassem Abdallah
University of Johannesburg
Verified email at chbe.gatech.edu
Title
Cited by
Cited by
Year
DSA grapho-epitaxy process with etch stop material
JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ...
US Patent 8,859,433, 2014
1762014
Crosslinking using rapid thermal processing for the fabrication of efficient solution-processed phosphorescent organic light-emitting diodes
CA Zuniga, J Abdallah, W Haske, Y Zhang, I Coropceanu, S Barlow, ...
Adv. Mater 25 (12), 1739-1744, 2013
792013
Grapho-epitaxy DSA process with dimension control of template pattern
JA Abdallah, ME Colburn, SJ Holmes, C Liu
US Patent 8,853,085, 2014
382014
Grapho-epitaxy DSA process with dimension control of template pattern
JA Abdallah, ME Colburn, SJ Holmes, C Liu
US Patent 8,853,085, 2014
382014
Extending Moore's law through advanced semiconductor design and processing techniques
W Lambrechts, S Sinha, JA Abdallah, J Prinsloo
CRC Press, 2018
322018
Computational aspects of optical lithography extension by directed self-assembly
K Lai, C Liu, J Pitera, DJ Dechene, A Schepis, J Abdallah, H Tsai, ...
Optical Microlithography XXVI 8683, 868304, 2013
312013
Simultaneous photoresist development and neutral polymer layer formation
SJ Holmes, JA Abdallah, J Cheng, ME Colburn, C Liu
US Patent 8,715,917, 2014
272014
Computational lithography platform for 193i-guided directed self-assembly
K Lai, M Ozlem, JW Pitera, C Liu, A Schepis, D Dechene, A Krasnoperova, ...
Optical Microlithography XXVII 9052, 361-372, 2014
162014
Directed self-assembly process implementation in a 300mm pilot line environment
CC Liu, IC Estrada-Raygoza, J Abdallah, S Holmes, Y Yin, A Schepis, ...
Alternative Lithographic Technologies V 8680, 322-329, 2013
152013
Rework and stripping of complex patterning layers using chemical mechanical polishing
JA Abdallah, RR Patlolla, BC Peethala
US Patent 9,190,285, 2015
132015
Grapho-epitaxy DSA process with dimension control of template pattern
JA Abdallah, ME Colburn, SJ Holmes, C Liu
US Patent 9,123,658, 2015
132015
UV-induced porosity using photogenerated acids to catalyze the decomposition of sacrificial polymers templated in dielectric films
J Abdallah, M Silver, SAB Allen, PA Kohl
Journal of Materials Chemistry 17 (9), 873-885, 2007
102007
Pattern Scaling of Holes, Bars, and Trenches with Directed Self-Assembly using Polymer Blend
Y Matsui, CC Lin, JA Abdallah, C Tseng, Y Xu, M Colburn
Journal of Photopolymer Science and Technology 26 (1), 59-63, 2013
32013
The Importance of Photolithography for Moore’s Law
L Wynand, S Saurabh, A Jassem
Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018
12018
The Fabrication of Direct-Write Waveguides via the glassy-state processing of porous films: UV-induced porosity and solvent-induced porosity
J Abdallah
12007
Future Semiconductor Devices: Exotic Materials, Alternative Architectures and Prospects
W Lambrechts, S Sinha, J Abdallah, J Prinsloo
Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018
2018
The Economics of Semiconductor Scaling
L Wynand, S Saurabh, P Jaco, A Jassem
Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018
2018
Photolithography Enhancements
L Wynand, S Saurabh, A Jassem
Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018
2018
The Driving Forces Behind Moore’s Law and Its Impact on Technology
L Wynand, S Saurabh, A Jassem
Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018
2018
5 Future Semiconductor Devices
W Lambrechts, S Sinha, J Abdallah, J Prinsloo
Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018
2018
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