| DSA grapho-epitaxy process with etch stop material JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ... US Patent 8,859,433, 2014 | 178 | 2014 |
| Crosslinking using rapid thermal processing for the fabrication of efficient solution-processed phosphorescent organic light-emitting diodes CA Zuniga, J Abdallah, W Haske, Y Zhang, I Coropceanu, S Barlow, ... Adv. Mater 25 (12), 1739-1744, 2013 | 83 | 2013 |
| Grapho-epitaxy DSA process with dimension control of template pattern JA Abdallah, ME Colburn, SJ Holmes, C Liu US Patent 8,853,085, 2014 | 38 | 2014 |
| Computational aspects of optical lithography extension by directed self-assembly K Lai, C Liu, J Pitera, DJ Dechene, A Schepis, J Abdallah, H Tsai, ... Optical Microlithography XXVI 8683, 868304, 2013 | 32 | 2013 |
| Extending Moore's law through advanced semiconductor design and processing techniques W Lambrechts, S Sinha, JA Abdallah, J Prinsloo CRC Press, 2018 | 31 | 2018 |
| Simultaneous photoresist development and neutral polymer layer formation SJ Holmes, JA Abdallah, J Cheng, ME Colburn, C Liu US Patent 8,715,917, 2014 | 27 | 2014 |
| Computational lithography platform for 193i-guided directed self-assembly K Lai, M Ozlem, JW Pitera, C Liu, A Schepis, D Dechene, A Krasnoperova, ... Optical Microlithography XXVII 9052, 361-372, 2014 | 16 | 2014 |
| Directed self-assembly process implementation in a 300mm pilot line environment CC Liu, IC Estrada-Raygoza, J Abdallah, S Holmes, Y Yin, A Schepis, ... Alternative Lithographic Technologies V 8680, 322-329, 2013 | 15 | 2013 |
| Rework and stripping of complex patterning layers using chemical mechanical polishing JA Abdallah, RR Patlolla, BC Peethala US Patent 9,190,285, 2015 | 13 | 2015 |
| Grapho-epitaxy DSA process with dimension control of template pattern JA Abdallah, ME Colburn, SJ Holmes, C Liu US Patent 9,123,658, 2015 | 13 | 2015 |
| UV-induced porosity using photogenerated acids to catalyze the decomposition of sacrificial polymers templated in dielectric films J Abdallah, M Silver, SAB Allen, PA Kohl Journal of Materials Chemistry 17 (9), 873-885, 2007 | 10 | 2007 |
| Pattern Scaling of Holes, Bars, and Trenches with Directed Self-Assembly using Polymer Blend Y Matsui, CC Lin, JA Abdallah, C Tseng, Y Xu, M Colburn Journal of Photopolymer Science and Technology 26 (1), 59-63, 2013 | 3 | 2013 |
| The Importance of Photolithography for Moore’s Law L Wynand, S Saurabh, A Jassem Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018 | 1 | 2018 |
| The Fabrication of Direct-Write Waveguides via the glassy-state processing of porous films: UV-induced porosity and solvent-induced porosity J Abdallah | 1 | 2007 |
| Future Semiconductor Devices: Exotic Materials, Alternative Architectures and Prospects W Lambrechts, S Sinha, J Abdallah, J Prinsloo Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018 | | 2018 |
| The Economics of Semiconductor Scaling L Wynand, S Saurabh, P Jaco, A Jassem Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018 | | 2018 |
| Photolithography Enhancements L Wynand, S Saurabh, A Jassem Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018 | | 2018 |
| The Driving Forces Behind Moore’s Law and Its Impact on Technology L Wynand, S Saurabh, A Jassem Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018 | | 2018 |
| 5 Future Semiconductor Devices W Lambrechts, S Sinha, J Abdallah, J Prinsloo Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018 | | 2018 |
| 3 The Importance of W Lambrechts, S Sinha, J Abdallah Extending Moore's Law through Advanced Semiconductor Design and Processing …, 2018 | | 2018 |
