| Effects of low substrate temperature and ion assisted deposition on composition, optical properties, and stress of ZnS thin films JA Ruffner, MD Himel, V Mizrahi, GI Stegeman, UJ Gibson Applied optics 28 (24), 5209-5214, 1989 | 93 | 1989 |
| Measurement of planar waveguide losses using a coherent fiber bundle MD Himel, UJ Gibson Applied optics 25 (23), 4413-4416, 1986 | 62 | 1986 |
| Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach MD Himel, RE Hutchins, JC Colvin, MK Poutous, AD Kathman, AS Fedor Optical Microlithography XIV 4346, 1436-1442, 2001 | 58 | 2001 |
| Development and Characterization of a 10x Schwarzschild System for Soft-X-Ray Projection Lithography DA Tichenor, GD Kubiak, ME Malinowski, RH Stulen, SJ Haney, ... Soft X-Ray Projection Lithography, TuA. 3, 1993 | 27 | 1993 |
| An improved process for manufacturing diffractive optical elements (DOEs) for off-axis illumination systems J Leonard, J Carriere, J Stack, R Jones, M Himel, J Childers, K Welch Optical Microlithography XXI 6924, 901-911, 2008 | 23 | 2008 |
| Advances in DOE modeling and optical performance for SMO applications J Carriere, J Stack, J Childers, K Welch, MD Himel Optical Microlithography XXIII 7640, 793-801, 2010 | 22 | 2010 |
| Micrascan III: performance of a third-generation catadioptric step-and-scan lithographic tool DR Cote, KW Andresen, DJ Cronin, HG Harrold, MD Himel, J Kane, ... Optical Microlithography X 3051, 806-816, 1997 | 22 | 1997 |
| Soft-x-ray projection lithography experiments using Schwarzschild imaging optics DA Tichenor, GD Kubiak, ME Malinowski, RH Stulen, SJ Haney, ... Applied optics 32 (34), 7068-7071, 1993 | 22 | 1993 |
| Micrascan III: 0.25-um resolution step-and-scan system DM Williamson, JA McClay, KW Andresen, GM Gallatin, MD Himel, ... Optical Microlithography IX 2726, 780-786, 1996 | 21 | 1996 |
| Development of a laboratory extreme-ultraviolet lithography tool DA Tichenor, GD Kubiak, ME Malinowski, RH Stulen, SJ Haney, ... Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for …, 1994 | 20 | 1994 |
| Electrooptic beam deflection using the leaky mode of a planar waveguide MD Himel, X Shi, XQ Hu, MG Moharam, KH Guenther IEEE photonics technology letters 3 (10), 921-923, 1991 | 20 | 1991 |
| 10x reduction imaging at 13.4 nm DA Tichenor, AK Ray-Chaudhuri, GD Kubiak, SJ Haney, KW Berger, ... Extreme Ultraviolet Lithography, EOS. 89, 1994 | 16 | 1994 |
| Enabling process window improvement at 45nm and 32nm with free-form DOE illumination TH Coskun, A Sezginer, V Kamat, M Kruger, B Yenikaya, J Carriere, ... Optical Microlithography XXII 7274, 94-104, 2009 | 14 | 2009 |
| [1] Stress modification and reduced waveguide losses in ZnS thin films MD Himel, JA Ruffner, UJ Gibson Applied optics 27 (14), 2810-2811, 1988 | 13 | 1988 |
| Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography JE Childers, T Baker, T Emig, J Carriere, MD Himel Laser Beam Shaping X 7430, 179-186, 2009 | 9 | 2009 |
| Optical waveguide characterization of dielectric films deposited by reactive low-voltage ion plating TC Kimble, MD Himel, KH Guenther Applied optics 32 (28), 5640-5644, 1993 | 9 | 1993 |
| Resist performance in soft x-ray projection lithography GD Kubiak, DA Tichenor, WW Chow, WC Sweatt, MD Himel Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for …, 1993 | 9 | 1993 |
| WM Mansf ield, WK Waskiewicz, DL White, and DL Windt DA Tichenor, GD Kubiak, ME Malinowski, RH Stulen, SJ Haney, ... Appl. Opt 32, 7068, 1993 | 9 | 1993 |
| Characterization of an expanded‐field Schwarzschild objective for extreme ultraviolet lithography GD Kubiak, DA Tichenor, AK Ray‐Chaudhuri, ME Malinowski, RH Stulen, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 8 | 1994 |
| Soft-x-ray projection imaging with a 1: 1 ring-field optic AA MacDowell, JE Bjorkholm, K Early, RR Freeman, MD Himel, ... Applied optics 32 (34), 7072-7078, 1993 | 8 | 1993 |
