Lithographic benefits and mask manufacturability study of curvilinear masks VW Guo, F Jiang, J Rankin, I Bork, A Tritchkov, A Wei, Y Sun, S Jayaram, ... Photomask Technology 2018 10810, 106-118, 2018 | 16 | 2018 |
Reduction of systematic defects with machine learning from design to fab Y Ma, L Hong, J Word, F Jiang, V Liubich, L Cao, S Jayaram, D Kwak, ... Advanced Etch Technology for Nanopatterning IX 11329, 12-25, 2020 | 12 | 2020 |
Effective model-based SRAF placement for full chip 2D layouts S Jayaram, P LaCour, J Word, A Tritchkov Optical Microlithography XXVI 8683, 132-140, 2013 | 11 | 2013 |
Impact of illumination source symmetrization in OPC JL Sturtevant, L Hong, S Jayaram, SP Renwick, M McCallum, ... Photomask and Next-Generation Lithography Mask Technology XV 7028, 1078-1087, 2008 | 11 | 2008 |
Subresolution assist features impact and implementation in extreme ultraviolet lithography for next-generation beyond 7-nm node VW Guo, F Jiang, A Tritchkov, S Jayaram, S Mansfield, L Zhuang, Y Sun, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 18 (1), 011003-011003, 2019 | 9 | 2019 |
Automatic assist feature placement optimization based on process-variability reduction S Jayaram, A Yehia, M Bahnas, HAM Omar, Z Bozkus, JL Sturtevant Photomask Technology 2007 6730, 816-824, 2007 | 9 | 2007 |
Model-based SRAF solutions for advanced technology nodes S Jayaram, P LaCour, J Word, A Tritchkov 29th European Mask and Lithography Conference 8886, 174-182, 2013 | 8 | 2013 |
Exposure tool specific post-OPC verification J Sturtevant, S Jayaram, L Hong Design for Manufacturability through Design-Process Integration II 6925, 245-253, 2008 | 7 | 2008 |
SRAF requirements, relevance, and impact on EUV lithography for next-generation beyond 7nm node VW Guo, F Jiang, A Tritchkov, S Jayaram, S Mansfield, L Zhuang, Y Sun, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 149-160, 2018 | 5 | 2018 |
Automatic SRAF size optimization during OPC S Jayaram, J Word Optical Microlithography XXII 7274, 789-798, 2009 | 5 | 2009 |
Process variability band analysis for quantitative optimization of exposure conditions JL Sturtevant, S Jayaram, L Hong Design for Manufacturability through Design-Process Integration III 7275 …, 2009 | 5 | 2009 |
Novel method for optimizing lithography exposure conditions using full-chip post-OPC simulation J Sturtevant, S Jayaram, L Hong, A Drozdov Optical Microlithography XXI 6924, 1252-1262, 2008 | 5 | 2008 |
Virtual cross metrology: leveraging process sequence for improved process characterization JA Torres, I Kissiov, M Tao, G Mueller, S Schueler, C Hartig, R Gardner, ... Metrology, Inspection, and Process Control XXXVI 12053, 430-440, 2022 | 4 | 2022 |
Virtual metrology: how to build the bridge between the different data sources S Schueler, C Hartig, A Torres, I Kissiov, R Gardner, E Mohamed, ... Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 4 | 2021 |
Influence of the illumination source on model-based SRAF placement R Gupta, A Dave, E Tejnil, S Jayaram, P LaCour Optical Microlithography XXIV 7973, 627-634, 2011 | 4 | 2011 |
Automotive Process Reliability Prediction for 5, 7nm using ML S Jayaram, HJ Lee, D Kim, S Choi, S Hong, S Lee, D Kwak, S Paek, ... 2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2023 | 2 | 2023 |
Design-aware virtual metrology and process recipe recommendation NG Greeneltch, H Yin, JA Torres, M Tao, SM Lubin, S Jayaram, I Kissiov, ... DTCO and Computational Patterning II 12495, 445-450, 2023 | 2 | 2023 |
EUV implementation of assist features in contact patterns F Jiang, A Raghunathan, M Burkhardt, N Saulnier, A Tritchkov, S Jayaram, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 530-540, 2016 | 2 | 2016 |
Impact of illumination on model-based SRAF placement for contact patterning JL Sturtevant, S Jayaram, O El-Sewefy, A Dave, P LaCour Optical Microlithography XXIII 7640, 1080-1085, 2010 | 2 | 2010 |
The PIXBAR OPC for contact-hole pattern in sub-70-nm generation KY Chen, CC Liao, SH Chen, T Wey, P Cheng, P Chou, J Schacht, ... Design for Manufacturability through Design-Process Integration III 7275 …, 2009 | 2 | 2009 |