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Dominique Abessolo Ondo
Dominique Abessolo Ondo
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Title
Cited by
Cited by
Year
Room‐Temperature Plasma‐Assisted Inkjet Printing of Highly Conductive Silver on Paper
CE Knapp, JB Chemin, SP Douglas, DA Ondo, J Guillot, P Choquet, ...
Advanced Materials Technologies 3 (3), 1700326, 2018
402018
Porous gelatin membrane obtained from pickering emulsions stabilized by graphene oxide
S Nagarajan, D Abessolo Ondo, S Gassara, M Bechelany, S Balme, ...
Langmuir 34 (4), 1542-1549, 2018
342018
Atmospheric plasma oxidative polymerization of ethylene dioxythiophene (EDOT) for the large‐scale preparation of highly transparent conducting thin films
D Abessolo Ondo, F Loyer, JB Chemin, S Bulou, P Choquet, ND Boscher
Plasma Processes and Polymers 15 (4), 1700172, 2018
252018
Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low-k Polymer Insulating Layers by Plasma-Initiated Chemical Vapor Deposition
D Abessolo Ondo, F Loyer, F Werner, R Leturcq, PJ Dale, ND Boscher
ACS Applied Polymer Materials 1 (12), 3304-3312, 2019
82019
Influence of double bonds and cyclic structure on the AP‐PECVD of low‐k organosilicon insulating layers
D Abessolo Ondo, F Loyer, ND Boscher
Plasma Processes and Polymers 18 (3), 2000222, 2021
52021
Plasma‐initiated chemical vapour deposition of organosiloxane thin films: From the growth mechanisms to ultrathin low‐k polymer insulating layers
D Abessolo Ondo, R Leturcq, ND Boscher
Plasma Processes and Polymers 17 (7), 2000032, 2020
12020
Plasma Initiated Chemical Vapour Deposition-from the Growth Mechanisms to Ultrathin Low-k Polymer Insulating Layers
D Abessolo Ondo
Unilu-University of Luxembourg, Esch sur Alzette, Luxembourg, 2021
2021
Inside Front Cover Picture: Plasma Process. Polym. 7/2020
D Abessolo Ondo, R Leturcq, ND Boscher
Plasma Processes and Polymers 17 (7), 2070016, 2020
2020
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