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Louis Rassinfosse
Louis Rassinfosse
Verified email at student.unamur.be
Title
Cited by
Cited by
Year
Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?
L Rassinfosse, JL Colaux, D Pilloud, A Nomine, N Tumanov, S Lucas, ...
Applied Surface Science 502, 144176, 2020
72020
When magnetron sputtering deposition meets machine learning: Application to process anomaly detection
V Delchevalerie, N de Moor, L Rassinfosse, E Haye, B Frenay, S Lucas
Surface and Coatings Technology 477, 130301, 2024
2024
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Articles 1–2