Development of hafnium based high-k materials—A review JH Choi, Y Mao, JP Chang Materials Science and Engineering: R: Reports 72 (6), 97-136, 2011 | 604 | 2011 |
Lecture notes on principles of plasma processing FF Chen, JP Chang Springer Science & Business Media, 2012 | 361 | 2012 |
Infrared spectroscopic analysis of the interface structure of thermally oxidized silicon KT Queeney, MK Weldon, JP Chang, YJ Chabal, AB Gurevich, J Sapjeta, ... Journal of Applied Physics 87 (3), 1322-1330, 2000 | 352 | 2000 |
Controlled nano-doping of ultra thin films JP Chang, TT Van, T Chiang, C Deshpandey, K Lesser US Patent 7,544,398, 2009 | 324 | 2009 |
Profiling nitrogen in ultrathin silicon oxynitrides with angle-resolved x-ray photoelectron spectroscopy JP Chang, ML Green, VM Donnelly, RL Opila, J Eng Jr, J Sapjeta, ... Journal of Applied Physics 87 (9), 4449-4455, 2000 | 323 | 2000 |
Dielectric property and thermal stability of on silicon YS Lin, R Puthenkovilakam, JP Chang Applied physics letters 81 (11), 2041-2043, 2002 | 319 | 2002 |
A study of the synthetic methods and properties of graphenes CNR Rao, KS Subrahmanyam, HSSR Matte, B Abdulhakeem, ... Science and Technology of Advanced Materials 11 (5), 054502, 2010 | 227 | 2010 |
Electrical performance of Al2O3 gate dielectric films deposited by atomic layer deposition on 4H-SiC CM Tanner, YC Perng, C Frewin, SE Saddow, JP Chang Applied Physics Letters 91 (20), 2007 | 201 | 2007 |
Kinetic study of low energy argon ion-enhanced plasma etching of polysilicon with atomic/molecular chlorine JP Chang, JC Arnold, GCH Zau, HS Shin, HH Sawin Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (4 …, 1997 | 190 | 1997 |
Kinetic study of low energy ion-enhanced polysilicon etching using Cl, Cl2, and Cl+ beam scattering JP Chang, HH Sawin Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997 | 186 | 1997 |
Physics of high-pressure helium and argon radio-frequency plasmas M Moravej, X Yang, GR Nowling, JP Chang, RF Hicks, SE Babayan Journal of applied physics 96 (12), 7011-7017, 2004 | 176 | 2004 |
In situ control of atomic-scale Si layer with huge strain in the nanoheterostructure NiSi/Si/NiSi through point contact reaction KC Lu, WW Wu, HW Wu, CM Tanner, JP Chang, LJ Chen, KN Tu Nano letters 7 (8), 2389-2394, 2007 | 162 | 2007 |
Active Layer-Incorporated, Spectrally Tuned Au/SiO2 Core/Shell Nanorod-Based Light Trapping for Organic Photovoltaics V Jankovic, Y Yang, J You, L Dou, Y Liu, P Cheung, JP Chang, Y Yang ACS nano 7 (5), 3815-3822, 2013 | 160 | 2013 |
Patterning and templating for nanoelectronics K Galatsis, KL Wang, M Ozkan, CS Ozkan, Y Huang, JP Chang, ... Advanced Materials 22 (6), 769-778, 2010 | 155 | 2010 |
Method for depositing a coating having a relatively high dielectric constant onto a substrate J Chang, YS Lin, A Kepten, M Sendler, S Levy, R Bloom US Patent 6,884,719, 2005 | 153 | 2005 |
Dielectric property and conduction mechanism of ultrathin zirconium oxide films JP Chang, YS Lin Applied physics letters 79 (22), 3666-3668, 2001 | 152 | 2001 |
Synthesis and luminescence properties of erbium-doped Y2O3 nanotubes Y Mao, JY Huang, R Ostroumov, KL Wang, JP Chang The Journal of Physical Chemistry C 112 (7), 2278-2285, 2008 | 148 | 2008 |
Luminescence of Nanocrystalline Erbium‐Doped Yttria Y Mao, T Tran, X Guo, JY Huang, CK Shih, KL Wang, JP Chang Advanced Functional Materials 19 (5), 748-754, 2009 | 145 | 2009 |
Plasma-surface kinetics and feature profile evolution in chlorine etching of polysilicon JP Chang, AP Mahorowala, HH Sawin Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (1 …, 1998 | 140 | 1998 |
Mechanical shuttling of linear motor-molecules in condensed phases on solid substrates TJ Huang, HR Tseng, L Sha, W Lu, B Brough, AH Flood, BD Yu, ... Nano Letters 4 (11), 2065-2071, 2004 | 138 | 2004 |