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Ji-Hoon Ahn
Ji-Hoon Ahn
Verified email at hanyang.ac.kr - Homepage
Title
Cited by
Cited by
Year
Deterministic Two-Dimensional Polymorphism Growth of Hexagonal n-type SnS2 and Orthorhombic p-type SnS Crystals
JH Ahn, MJ Lee, H Heo, JH Sung, K Kim, H Hwang, MH Jo
Nano letters 15 (6), 3703-3708, 2015
3432015
Thermoelectric materials by using two-dimensional materials with negative correlation between electrical and thermal conductivity
MJ Lee, JH Ahn, JH Sung, H Heo, SG Jeon, W Lee, JY Song, KH Hong, ...
Nature Communications 7 (1), 1-7, 2016
2582016
Interlayer orientation-dependent light absorption and emission in monolayer semiconductor stacks
H Heo, JH Sung, S Cha, BG Jang, JY Kim, G Jin, D Lee, JH Ahn, MJ Lee, ...
Nature communications 6 (1), 7372, 2015
2022015
Rotation-misfit-free heteroepitaxial stacking and stitching growth of hexagonal transition-metal dichalcogenide monolayers by nucleation kinetics controls.
H Heo, JH Sung, G Jin, JH Ahn, K Kim, MJ Lee, S Cha, H Choi, MH Jo
Advanced Materials (Deerfield Beach, Fla.) 27 (25), 3803-3810, 2015
1562015
Wafer‐Scale Synthesis of Reliable High‐Mobility Molybdenum Disulfide Thin Films via Inhibitor‐Utilizing Atomic Layer Deposition
W Jeon, Y Cho, S Jo, JH Ahn, SJ Jeong
Advanced Materials, 2017
752017
Understanding tunneling electroresistance effect through potential profile in Pt/Hf0. 5Zr0. 5O2/TiN ferroelectric tunnel junction memory
J Yoon, S Hong, YW Song, JH Ahn, SE Ahn
Applied Physics Letters 115 (15), 2019
722019
Self‐formed channel devices based on vertically grown 2D materials with large‐surface‐area and their potential for chemical sensor applications
C Kim, JC Park, SY Choi, Y Kim, SY Seo, TE Park, SH Kwon, B Cho, ...
Small 14 (15), 1704116, 2018
672018
Step coverage modeling of thin films in atomic layer deposition
JY Kim, JH Ahn, SW Kang, JH Kim
Journal of applied physics 101 (7), 2007
612007
Synthesis mechanism of MoS2 layered crystals by chemical vapor deposition using MoO3 and sulfur powders
CM Hyun, JH Choi, SW Lee, JH Park, KT Lee, JH Ahn
Journal of Alloys and Compounds 765, 380-384, 2018
552018
Improved electrical performance of a sol–gel IGZO transistor with high-k Al2O3 gate dielectric achieved by post annealing
E Lee, TH Kim, SW Lee, JH Kim, J Kim, TG Jeong, JH Ahn, B Cho
Nano convergence 6, 1-8, 2019
522019
Ru films from bis (ethylcyclopentadienyl) ruthenium using ozone as a reactant by atomic layer deposition for capacitor electrodes
JY Kim, DS Kil, JH Kim, SH Kwon, JH Ahn, JS Roh, SK Park
Journal of The Electrochemical Society 159 (6), H560, 2012
482012
2D materials-based membranes for hydrogen purification: Current status and future prospects
E Yang, AB Alayande, K Goh, CM Kim, KH Chu, MH Hwang, JH Ahn, ...
International Journal of Hydrogen Energy 46 (20), 11389-11410, 2021
462021
Frank–van der Merwe Growth versus Volmer–Weber Growth in Successive Stacking of a Few‐Layer Bi2Te3/Sb2Te3 by van der Waals Heteroepitaxy: The …
H Heo, JH Sung, JH Ahn, F Ghahari, T Taniguchi, K Watanabe, P Kim, ...
Advanced Electronic Materials 3 (2), 1600375, 2017
362017
Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
JH Ahn, JY Kim, SW Kang, JH Kim, JS Roh
Applied Physics Letters 91 (6), 2007
362007
Highly stable artificial synapses based on ferroelectric tunnel junctions for neuromorphic computing applications
S Song, W Ham, G Park, W Kho, J Kim, H Hwang, HB Kim, H Song, ...
Advanced Materials Technologies 7 (7), 2101323, 2022
352022
Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
JH Ahn, SH Kwon
ACS Applied Materials & Interfaces 7 (28), 15587-15592, 2015
352015
Wafer-Scale Growth of a MoS2 Monolayer via One Cycle of Atomic Layer Deposition: An Adsorbate Control Method
DH Kim, JC Park, J Park, DY Cho, WH Kim, B Shong, JH Ahn, TJ Park
Chemistry of Materials 33 (11), 4099-4105, 2021
332021
Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
DK Lee, Z Wan, JS Bae, JH Ahn, SD Kim, J Kim, SH Kwon
Materials Letters 166, 163-166, 2016
332016
Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited via atomic layer deposition using cyclopentadienyl-based precursors without annealing
HB Kim, M Jung, Y Oh, SW Lee, D Suh, JH Ahn
Nanoscale 13 (18), 8524-8530, 2021
312021
Highly transparent and conductive oxide-metal-oxide electrodes optimized at the percolation thickness of AgOx for transparent silicon thin-film solar cells
H Jo, JH Yang, SW Choi, J Park, EJ Song, M Shin, JH Ahn, JD Kwon
Solar Energy Materials and Solar Cells 202, 110131, 2019
312019
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