Follow
Iwona Blaszczyk-Lezak
Iwona Blaszczyk-Lezak
Instituto de Ciencia y Tecnologia de Polimeros, CSIC
Verified email at ictp.csic.es
Title
Cited by
Cited by
Year
Confinement effects on polymer crystallization: From droplets to alumina nanopores
RM Michell, I Blaszczyk-Lezak, C Mijangos, AJ Müller
Polymer 54 (16), 4059-4077, 2013
1952013
The crystallization of confined polymers and block copolymers infiltrated within alumina nanotube templates
RM Michell, AT Lorenzo, AJ Müller, MC Lin, HL Chen, I Blaszczyk-Lezak, ...
Macromolecules 45 (3), 1517-1528, 2012
1332012
Confined crystallization of polymers within anodic aluminum oxide templates
RM Michell, I Blaszczyk‐Lezak, C Mijangos, AJ Müller
Journal of Polymer Science Part B: Polymer Physics 52 (18), 1179-1194, 2014
752014
One dimensional PMMA nanofibers from AAO templates. Evidence of confinement effects by dielectric and Raman analysis
I Blaszczyk-Lezak, M Hernández, C Mijangos
Macromolecules 46 (12), 4995-5002, 2013
672013
Optically active luminescent perylene thin films deposited by plasma polymerization
I Blaszczyk-Lezak, FJ Aparicio, A Borrás, A Barranco, A Alvarez-Herrero, ...
The Journal of Physical Chemistry C 113 (1), 431-438, 2009
512009
Silicon Carbonitride (SiCN) Films by Remote Hydrogen Microwave Plasma CVD from Tris (dimethylamino) silane as Novel Single‐Source Precursor
AM Wrobel, I Blaszczyk‐Lezak, P Uznanski, B Glebocki
Chemical Vapor Deposition 16 (7‐9), 211-215, 2010
492010
Transparent nanometric organic luminescent films as UV-active components in photonic structures
FJ Aparicio, M Holgado, A Borras, I Blaszczyk-Lezak, A Griol, CA Barrios, ...
John Wiley & Sons, 2011
472011
In-situ polymerization of styrene in AAO nanocavities
JM Giussi, I Blaszczyk-Lezak, MS Cortizo, C Mijangos
Polymer 54 (26), 6886-6893, 2013
462013
Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 1. Growth mechanism, structure, and surface morphology of silicon …
I Blaszczyk-Lezak, AM Wrobel, T Aoki, Y Nakanishi, I Kucinska, A Tracz
Thin solid films 497 (1-2), 24-34, 2006
452006
Incorporation and Thermal Evolution of Rhodamine 6G Dye Molecules Adsorbed in Porous Columnar Optical SiO2 Thin Films
JR Sánchez-Valencia, I Blaszczyk-Lezak, JP Espinós, S Hamad, ...
Langmuir 25 (16), 9140-9148, 2009
392009
Silicon carbonitride films produced by remote hydrogen microwave plasma CVD using a (dimethylamino) dimethylsilane precursor
I Blaszczyk‐Lezak, AM Wrobel, MPM Kivitorma, IJ Vayrynen
Chemical vapor deposition 11 (1), 44-52, 2005
392005
Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino) dimethylsilane precursor: Characterization of the process …
I Blaszczyk-Lezak, AM Wrobel, MPM Kivitorma, IJ Vayrynen, T Aoki
Diamond and related materials 15 (9), 1484-1491, 2006
372006
Silicon carbonitride by remote microwave plasma CVD from organosilicon precursor: Growth mechanism and structure of resulting Si: C: N films
I Blaszczyk-Lezak, AM Wrobel, MPM Kivitorma, IJ Vayrynen, A Tracz
Applied surface science 253 (17), 7211-7218, 2007
352007
Plasma Deposition of Perylene–Adamantane Nanocomposite Thin Films for NO2 Room-Temperature Optical Sensing
FJ Aparicio, I Blaszczyk-Lezak, JR Sanchez-Valencia, M Alcaire, ...
The Journal of Physical Chemistry C 116 (15), 8731-8740, 2012
282012
Remote Hydrogen Microwave Plasma Chemical Vapor Deposition of Amorphous Silicon Carbonitride (a‐SiCN) Coatings Derived From Tris (dimethylamino) Silane
AM Wrobel, I Blaszczyk‐Lezak, P Uznanski, B Glebocki
Plasma Processes and Polymers 8 (6), 542-556, 2011
282011
Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 2. Properties of deposited silicon carbonitride films
I Blaszczyk-Lezak, AM Wrobel, DM Bielinski
Thin Solid Films 497 (1-2), 35-41, 2006
282006
Silicon carbonitride by remote microwave plasma CVD from organosilicon precursor: Physical and mechanical properties of deposited Si: C: N films
I Blaszczyk-Lezak, AM Wrobel
Applied surface science 253 (18), 7404-7411, 2007
272007
Silicon carbonitride thin‐film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single‐source precursor: Growth process …
AM Wrobel, I Blaszczyk‐Lezak, A Walkiewicz‐Pietrzykowska
Journal of applied polymer science 105 (1), 122-129, 2007
272007
Hard and high-temperature-resistant silicon carbonitride coatings based on N-silyl-substituted cyclodisilazane rings
AM Wrobel, I Blaszczyk-Lezak, A Walkiewicz-Pietrzykowska, T Aoki, ...
Journal of the Electrochemical Society 155 (4), K66, 2008
252008
Remote hydrogen microwave plasma CVD of silicon carbonitride films from a tetramethyldisilazane source. Part 1: Characterization of the process and structure of the films
AM Wrobel, I Blaszczyk‐Lezak
Chemical Vapor Deposition 13 (11), 595-600, 2007
242007
The system can't perform the operation now. Try again later.
Articles 1–20