| Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars MD Henry, S Walavalkar, A Homyk, A Scherer Nanotechnology 20 (25), 255305, 2009 | 194 | 2009 |
| Phase-exchange-driven wake-up and fatigue in ferroelectric hafnium zirconium oxide films SS Fields, SW Smith, PJ Ryan, ST Jaszewski, IA Brummel, A Salanova, ... ACS applied materials & interfaces 12 (23), 26577-26585, 2020 | 114 | 2020 |
| Tunable visible and near-IR emission from sub-10 nm etched single-crystal Si nanopillars SS Walavalkar, CE Hofmann, AP Homyk, MD Henry, HA Atwater, ... Nano letters 10 (11), 4423-4428, 2010 | 114 | 2010 |
| Pyroelectric response in crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films JFI S. W. Smith, A. R. Kitahara, M. A. Rodriguez, M. D. Henry, M. T. Brumbach Applied Physics Letters 110 (072901), 2017 | 104 | 2017 |
| Ga+ beam lithography for nanoscale silicon reactive ion etching MD Henry, MJ Shearn, B Chhim, A Scherer Nanotechnology 21 (24), 245303, 2010 | 81 | 2010 |
| ICP etching of silicon for micro and nanoscale devices MD Henry California Institute of Technology, 2010 | 81 | 2010 |
| Advanced plasma processing: etching, deposition, and wafer bonding techniques for semiconductor applications M Shearn, X Sun, MD Henry, A Yariv, A Scherer Semiconductor technologies 27, 81-105, 2010 | 70 | 2010 |
| Al0. 68Sc0. 32N Lamb wave resonators with electromechanical coupling coefficients near 10.28% G Esteves, TR Young, Z Tang, S Yen, TM Bauer, MD Henry, RH Olsson Applied Physics Letters 118 (17), 2021 | 58 | 2021 |
| Methods for fabrication of high aspect ratio micropillars and nanopillars MD Henry, AP Homyk, A Scherer, S Walavalkar US Patent 8,148,264, 2012 | 56 | 2012 |
| Techniques of cryogenic reactive ion etching in silicon for fabrication of sensors MD Henry, C Welch, A Scherer Journal of Vacuum Science & Technology A 27 (5), 1211-1216, 2009 | 47 | 2009 |
| Radial pn junction, wire array solar cells BM Kayes, MA Filler, MD Henry, JR Maiolo Iii, MD Kelzenberg, ... 2008 33rd IEEE Photovoltaic Specialists Conference, 1-5, 2008 | 40 | 2008 |
| Origin of ferroelectric phase stabilization via the clamping effect in ferroelectric hafnium zirconium oxide thin films SS Fields, T Cai, ST Jaszewski, A Salanova, T Mimura, HH Heinrich, ... Advanced Electronic Materials 8 (12), 2200601, 2022 | 39 | 2022 |
| Surface encapsulation for low-loss silicon photonics M Borselli, TJ Johnson, CP Michael, MD Henry, O Painter Applied Physics Letters 91 (13), 131117-131117-3, 2007 | 39 | 2007 |
| Size tunable visible and near-infrared photoluminescence from vertically etched silicon quantum dots SS Walavalkar, AP Homyk, CE Hofmann, MD Henry, C Shin, HA Atwater, ... Applied Physics Letters 98 (15), 2011 | 36 | 2011 |
| Controllable deformation of silicon nanowires with strain up to 24% SS Walavalkar, AP Homyk, MD Henry, A Scherer Journal of Applied Physics 107 (12), 2010 | 32 | 2010 |
| Thermal resistance and heat capacity in hafnium zirconium oxide (Hf1–xZrxO2) dielectrics and ferroelectric thin films EA Scott, SW Smith, MD Henry, CM Rost, A Giri, JT Gaskins, SS Fields, ... Applied Physics Letters 113 (19), 2018 | 28 | 2018 |
| Reactive sputter deposition of piezoelectric Sc0. 12Al0. 88N for contour mode resonators MD Henry, TR Young, EA Douglas, BA Griffin Journal of Vacuum Science & Technology B 36 (3), 2018 | 28 | 2018 |
| Three-dimensional etching of silicon for the fabrication of low-dimensional and suspended devices SS Walavalkar, AP Homyk, MD Henry, A Scherer Nanoscale 5 (3), 927-931, 2013 | 28 | 2013 |
| Methods for fabricating passivated silicon nanowires and devices thus obtained A Scherer, S Walavalkar, MD Henry, AP Homyk US Patent 8,080,468, 2011 | 28 | 2011 |
| Wake-up and fatigue mechanisms in ferroelectric Hf0. 5Zr0. 5O2 films with symmetric RuO2 electrodes SS Fields, SW Smith, ST Jaszewski, T Mimura, DA Dickie, G Esteves, ... Journal of Applied Physics 130 (13), 2021 | 27 | 2021 |
Jon IhlefeldUniversity of VirginiaVerified email at virginia.edu
