| Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system A Lavoie, H Kang, P Kumar, S Swaminathan, J Qian, F Pasquale, ... US Patent 9,617,638, 2017 | 399 | 2017 |
| Method and apparatus for backside deposition reduction by control of wafer support to achieve edge seal A Duvall, C Baldasseroni US Patent 9,428,833, 2016 | 220 | 2016 |
| Systems and methods for vapor delivery in a substrate processing system J Qian, H Kang, P Kumar, C Baldasseroni, H Landis, AK Duvall, M Sabri, ... US Patent 9,970,108, 2018 | 210 | 2018 |
| Fe spin reorientation across the metamagnetic transition in strained FeRh thin films C Bordel, J Juraszek, DW Cooke, C Baldasseroni, S Mankovsky, J Minár, ... Physical Review Letters 109 (11), 117201, 2012 | 131 | 2012 |
| Temperature-driven nucleation of ferromagnetic domains in FeRh thin films C Baldasseroni, C Bordel, AX Gray, AM Kaiser, F Kronast, ... Applied Physics Letters 100 (26), 2012 | 112 | 2012 |
| Thermodynamic measurements of Fe-Rh alloys DW Cooke, F Hellman, C Baldasseroni, C Bordel, S Moyerman, ... Physical review letters 109 (25), 255901, 2012 | 105 | 2012 |
| Temperature-driven growth of antiferromagnetic domains in thin-film FeRh C Baldasseroni, C Bordel, C Antonakos, A Scholl, KH Stone, JB Kortright, ... Journal of Physics: Condensed Matter 27 (25), 256001, 2015 | 54 | 2015 |
| Effect of capping material on interfacial ferromagnetism in FeRh thin films C Baldasseroni, GK Pálsson, C Bordel, S Valencia, AA Unal, F Kronast, ... Journal of Applied Physics 115 (4), 2014 | 54 | 2014 |
| Low volume showerhead with faceplate holes for improved flow uniformity R Chandrasekharan, S Sangplung, S Swaminathan, F Pasquale, H Kang, ... US Patent 10,378,107, 2019 | 44 | 2019 |
| High spatial resolution Raman thermometry analysis of TiO2 microparticles N Lundt, ST Kelly, T Rödel, B Remez, AM Schwartzberg, A Ceballos, ... Review of Scientific Instruments 84 (10), 2013 | 28 | 2013 |
| Methods and apparatuses for stable deposition rate control in low temperature ald systems by showerhead active heating and/or pedestal cooling C Baldasseroni, A Lavoie, H Kang, J Qian, P Kumar, A Duvall, C Barnett, ... US Patent App. 14/466,925, 2016 | 21 | 2016 |
| Heat transfer simulation and thermal measurements of microfabricated x-ray transparent heater stages C Baldasseroni, DR Queen, DW Cooke, K Maize, A Shakouri, F Hellman Review of Scientific Instruments 82 (9), 2011 | 21 | 2011 |
| Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors FL Pasquale, C Baldasseroni, E Augustyniak, Y Sakiyama, ... US Patent 9,508,547, 2016 | 17 | 2016 |
| Magnetic imaging with full-field soft X-ray microscopies P Fischer, MY Im, C Baldasseroni, C Bordel, F Hellman, JS Lee, ... Journal of Electron Spectroscopy and Related Phenomena 189, 196-205, 2013 | 17 | 2013 |
| Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity H Kang, A Lavoie, S Swaminathan, J Qian, C Baldasseroni, F Pasquale, ... US Patent 9,793,096, 2017 | 16 | 2017 |
| Reducing backside deposition at wafer edge C Baldasseroni, A Duvall, R Blaquiere, S Swaminathan US Patent 10,648,079, 2020 | 13 | 2020 |
| Method for RF compensation in plasma assisted atomic layer deposition J Qian, FL Pasquale, A Lavoie, C Baldasseroni, H Kang, S Swaminathan, ... US Patent 9,624,578, 2017 | 13 | 2017 |
| Fill on demand ampoule refill T Nguyen, E Ranganathan, S Swaminathan, A Lavoie, C Baldasseroni, ... US Patent 11,072,860, 2021 | 10 | 2021 |
| Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system A Lavoie, H Kang, P Kumar, S Swaminathan, J Qian, FL Pasquale, ... US Patent 10,407,773, 2019 | 7 | 2019 |
| Hardware and process for film uniformity improvement P Kumar, H Kang, A Lavoie, YC Chiu, FL Pasquale, J Qian, ... US Patent 10,100,407, 2018 | 7 | 2018 |
