| Germination of Chenopodium album in response to microwave plasma treatment B Sera, V Stranák, M Serý, M Tichý, P Spatenka Plasma Science and Technology 10 (4), 506, 2008 | 161 | 2008 |
| Deposition of thin titanium–copper films with antimicrobial effect by advanced magnetron sputtering methods V Stranak, H Wulff, H Rebl, C Zietz, K Arndt, R Bogdanowicz, B Nebe, ... Materials Science and Engineering: C 31 (7), 1512-1519, 2011 | 143 | 2011 |
| Formation of TiOx films produced by high-power pulsed magnetron sputtering V Straňák, M Quaas, H Wulff, Z Hubička, S Wrehde, M Tichý, R Hippler Journal of Physics D: Applied Physics 41 (5), 055202, 2008 | 102 | 2008 |
| Optical monitoring of electrochemical processes with ITO-based lossy-mode resonance optical fiber sensor applied as an electrode M Śmietana, M Sobaszek, B Michalak, P Niedziałkowski, W Białobrzeska, ... Journal of Lightwave Technology 36 (4), 954-960, 2018 | 70 | 2018 |
| Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system V Straňák, S Block, S Drache, Z Hubička, CA Helm, L Jastrabík, M Tichý, ... Surface and Coatings Technology 205 (8-9), 2755-2762, 2011 | 68 | 2011 |
| Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films V Stranak, M Cada, Z Hubicka, M Tichy, R Hippler Journal of Applied Physics 108 (4), 2010 | 65 | 2010 |
| Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure V Straňák, M Čada, M Quaas, S Block, R Bogdanowicz, Š Kment, H Wulff, ... Journal of Physics D: Applied Physics 42 (10), 105204, 2009 | 63 | 2009 |
| Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering V Stranak, M Quaas, R Bogdanowicz, H Steffen, H Wulff, Z Hubicka, ... Journal of Physics D: Applied Physics 43 (28), 285203, 2010 | 54 | 2010 |
| Simultaneous optical and electrochemical label-free biosensing with ITO-coated lossy-mode resonance sensor M Śmietana, M Koba, P Sezemsky, K Szot-Karpińska, D Burnat, V Stranak, ... Biosensors and Bioelectronics 154, 112050, 2020 | 49 | 2020 |
| Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering V Stranak, AP Herrendorf, H Wulff, S Drache, M Cada, Z Hubicka, M Tichy, ... Surface and Coatings Technology 222, 112-117, 2013 | 46 | 2013 |
| Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering V Stranak, S Drache, R Bogdanowicz, H Wulff, AP Herrendorf, Z Hubicka, ... Surface and Coatings Technology 206 (11-12), 2801-2809, 2012 | 46 | 2012 |
| Photo-induced electrochemical functionality of the TiO2 nanoscale films S Kment, P Kluson, V Stranak, P Virostko, J Krysa, M Cada, J Pracharova, ... Electrochimica acta 54 (12), 3352-3359, 2009 | 46 | 2009 |
| Time-resolved probe diagnostics of pulsed DC magnetron discharge during deposition of TiOx layers V Straňák, Z Hubička, P Adamek, J Blažek, M Tichý, P Špatenka, ... Surface and Coatings Technology 201 (6), 2512-2519, 2006 | 45 | 2006 |
| Characterization of a magnetron plasma for deposition of titanium oxide and titanium nitride films R Hippler, S Wrehde, V Straňák, O Zhigalov, H Steffen, M Tichý, M Quaas, ... Contributions to Plasma Physics 45 (5‐6), 348-357, 2005 | 43 | 2005 |
| Antimicrobial potential of copper‐containing titanium surfaces generated by ion implantation and dual high power impulse magnetron sputtering B Finke, M Polak, F Hempel, H Rebl, C Zietz, V Stranak, G Lukowski, ... Advanced Engineering Materials 14 (5), B224-B230, 2012 | 38 | 2012 |
| Ionized vapor deposition of antimicrobial Ti–Cu films with controlled copper release V Stranak, H Wulff, P Ksirova, C Zietz, S Drache, M Cada, Z Hubicka, ... Thin Solid Films 550, 389-394, 2014 | 37 | 2014 |
| Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target R Hippler, M Cada, V Stranak, Z Hubicka Plasma Sources Science and Technology 28 (11), 115020, 2019 | 36 | 2019 |
| Optical investigations of electrochemical processes using a long-period fiber grating functionalized by indium tin oxide M Janczuk-Richter, M Piestrzyńska, D Burnat, P Sezemsky, V Stranak, ... Sensors and actuators B: chemical 279, 223-229, 2019 | 36 | 2019 |
| Highly ionized physical vapor deposition plasma source working at very low pressure V Stranak, AP Herrendorf, S Drache, M Cada, Z Hubicka, M Tichy, ... Applied Physics Letters 100 (14), 2012 | 36 | 2012 |
| Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges V Stranak, H Wulff, R Bogdanowicz, S Drache, Z Hubicka, M Cada, ... The European Physical Journal D 64, 427-435, 2011 | 35 | 2011 |
