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Hyoungcheol Kwon
Hyoungcheol Kwon
SK Hynix Inc.
Verified email at sk.com
Title
Cited by
Cited by
Year
Feasibility of nonthermal atmospheric pressure plasma for intracoronal bleaching
JK Park, SH Nam, HC Kwon, AAH Mohamed, JK Lee, GC Kim
International endodontic journal 44 (2), 170-175, 2011
952011
Electron heating mode transition induced by ultra-high frequency in atmospheric microplasmas for biomedical applications
HC Kwon, IH Won, JK Lee
Applied Physics Letters 100 (18), 2012
472012
A study on characterization of atmospheric pressure plasma jets according to the driving frequency for biomedical applications
YS Seo, HW Lee, HC Kwon, J Choi, SM Lee, KC Woo, KT Kim, JK Lee
Thin Solid Films 519 (20), 7071-7078, 2011
452011
Gas temperature effect on reactive species generation from the atmospheric pressure air plasma
HY Kim, SK Kang, HC Kwon, HW Lee, JK Lee
Plasma Processes and Polymers 10 (8), 686-697, 2013
432013
Distinctive plume formation in atmospheric Ar and He plasmas in microwave frequency band and suitability for biomedical applications
HW Lee, SK Kang, IH Won, HY Kim, HC Kwon, JY Sim, JK Lee
Physics of Plasmas 20 (12), 2013
392013
Abnormal electron-heating mode and formation of secondary-energetic electrons in pulsed microwave-frequency atmospheric microplasmas
HC Kwon, SY Jung, HY Kim, IH Won, JK Lee
Physics of Plasmas 21 (3), 2014
292014
A study of the role of various reactions on the density distribution of hydrogen, silylene, and silyl in SiH4/H2 plasma discharges
AR Aman-ur-Rehman, HC Kwon, WT Park, JK Lee
Physics of Plasmas 18 (9), 2011
252011
Enhanced transportation of energetic electrons in dual-frequency atmospheric microplasmas
HC Kwon, HY Kim, IH Won, HW Lee, HK Shin, JK Lee
Physics of Plasmas 20 (2), 2013
192013
A unified semi-global surface reaction model of polymer deposition and SiO2 etching in fluorocarbon plasma
WS Chang, YG Yook, HS You, JH Park, DC Kwon, MY Song, JS Yoon, ...
Applied Surface Science 515, 145975, 2020
132020
Universal surface reaction model of plasma oxide etching
HS You, YG Yook, WS Chang, JH Park, MJ Oh, DC Kwon, JS Yoon, ...
Journal of Physics D: Applied Physics 53 (38), 385207, 2020
72020
Comparative study between atmospheric microwave and low-frequency plasmas: Production efficiency of reactive species and their effectiveness
MS Kim, HY Kim, HK Shin, HC Kwon, JY Sim, JK Lee
Japanese Journal of Applied Physics 53 (5S1), 05FR02, 2014
62014
TCAD augmented generative adversarial network for hot-spot detection and mask-layout optimization in a large area HARC etching process
H Kwon, H Huh, H Seo, S Han, I Won, J Sue, D Oh, F Iza, S Lee, SK Park, ...
Physics of Plasmas 29 (7), 2022
52022
Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating
DC Kwon, DH Yu, H Kwon, YH Im, HC Lee
Physics of Plasmas 27 (7), 2020
52020
Negative resistance phenomenon in dual-frequency capacitively coupled plasma-enhanced chemical vapor deposition system for photovoltaic manufacturing process
HC Kwon, AR Aman‐ur‐Rehman, IH Won, WT Park, JK Lee
Journal of Applied Physics 111 (2), 2012
42012
Effect of heavy inert ion strikes on cell density-dependent profile variation and distortion during the etching process for high-aspect ratio features
H Kwon, I Won, S Han, DH Yu, DC Kwon, YH Im, F Iza, D Oh, SK Park, ...
Physics of Plasmas 29 (9), 2022
32022
Enhancement of microwave plasma characteristics for biomedical applications using pulse modulation method
HW Lee, SK Kang, SK Kwon, IH Won, HC Kwon, HY Kim, JK Lee, HW Lee
2013 19th IEEE Pulsed Power Conference (PPC), 1-4, 2013
32013
Investigation of layout effects in diode-triggered SCRs under very-fast TLP stress through full-size, calibrated 3D TCAD simulation
T Cilento, CS Yun, A Terterian, CH Lee, JE Moon, SW Lee, H Kwon, ...
Microelectronics Reliability 88, 1103-1107, 2018
22018
Effect of electron heating mode on charge-up damage in dual-frequency capacitive discharges
HC Kwon, SH Lee, AU Rehman, JK Lee
IEEE Transactions on Plasma Science 39 (11), 2530-2531, 2011
22011
Asynchronous pulse-modulated plasma effect on the generation of abnormal high-energetic electrons for the suppression of charge-up induced tilting and cell density-dependent …
H Kwon, F Iza, I Won, M Lee, S Han, R Park, Y Kim, D Oh, SK Park, S Cha
Physics of Plasmas 30 (1), 2023
2023
적대적 생성 신경망 (GAN) 을 이용한 Etch Mask 예측
허현석, 권형철, 이승철
한국소음진동공학회 학술대회논문집, 109-109, 2020
2020
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