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Matthew Colburn
Matthew Colburn
Meta Reality Labs, Oculus Research, IBM Research, University of Texas at Austin
Verified email at alumni.utexas.net - Homepage
Title
Cited by
Cited by
Year
Step and flash imprint lithography: a new approach to high-resolution patterning
M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ...
Microlithography'99, 379-389, 1999
10571999
STEP AND FLASH IMPRINT LITHOGRAPHY
CG Willson, ME Colburn
EP Patent 1,228,401, 2005
5812005
Step and flash imprint lithography
CG Willson, ME Colburn
US Patent 6,334,960, 2002
5782002
Polymer self assembly in semiconductor microelectronics
CT Black, R Ruiz, G Breyta, JY Cheng, ME Colburn, KW Guarini, HC Kim, ...
IBM Journal of Research and Development 51 (5), 605-633, 2007
5532007
Step and flash imprint lithography: Template surface treatment and defect analysis
T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ...
Journal of Vacuum Science & Technology B 18 (6), 3572-3577, 2000
5112000
Template for room temperature, low pressure micro-and nano-imprint lithography
T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt
US Patent 6,696,220, 2004
4222004
RECOVERY OF HYDROPHOBICITY OF LOW-K AND ULTRA LOW-K ORGANOSILICATE FILMS USED AS INTER METAL DIELECTRICS
N Chakrapani, ME Colburn, CD Dimitrakopoulos, SV Nitta, D Pfeiffer, ...
EP Patent 1,812,961, 2007
3382007
Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics
N Chakrapani, ME Colburn, CD Dimitrakopoulos, D Pfeiffer, ...
US Patent 7,687,913, 2010
3302010
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
JY Cheng, DP Sanders, HD Truong, S Harrer, A Friz, S Holmes, ...
Acs Nano 4 (8), 4815-4823, 2010
2802010
Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography
P Ruchhoeft, M Colburn, B Choi, H Nounu, S Johnson, T Bailey, S Damle, ...
Journal of Vacuum Science & Technology B 17 (6), 2965-2969, 1999
2111999
Sidewall image transfer process employing a cap material layer for a metal nitride layer
JC Arnold, SD Burns, ME Colburn, DV Horak, Y Yin
US Patent 20,120,282,779, 2012
1772012
Sidewall image transfer process employing a cap material layer for a metal nitride layer
JC Arnold, SD Burns, ME Colburn, DV Horak, Y Yin
US Patent 8,298,954, 2012
1772012
Closed air gap interconnect structure
KL Saenger, M Surendra, SV Nitta, S Purushothaman, ME Colburn, ...
US Patent 7,361,991, 2008
1772008
Design of orientation stages for step and flash imprint lithography
BJ Choi, SV Sreenivasan, S Johnson, M Colburn, CG Wilson
Precision Engineering 25 (3), 192-199, 2001
1762001
DSA grapho-epitaxy process with etch stop material
JA Abdallah, ME Colburn, SJ Holmes, D Kawamura, C Liu, ...
US Patent 8,859,433, 2014
1752014
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ...
ACS nano 8 (5), 5227-5232, 2014
1752014
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
R Xie, P Montanini, K Akarvardar, N Tripathi, B Haran, S Johnson, T Hook, ...
2016 IEEE International Electron Devices Meeting (IEDM), 2.7. 1-2.7. 4, 2016
1712016
Step and flash imprint lithography for sub-100-nm patterning
M Colburn, A Grot, MN Amistoso, BJ Choi, TC Bailey, JG Ekerdt, ...
Microlithography 2000, 453-457, 2000
1682000
Development and advantages of step-and-flash lithography
M Colburn, T Bailey, BJ Choi, JG Ekerdt, SV Sreenivasan, CG Willson
Solid State Technology 44 (7), 67-80, 2001
1622001
High-resolution overlay alignment methods for imprint lithography
SV Sreenivasan, BJ Choi, M Colburn, T Bailey
US Patent 6,921,615, 2005
1602005
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