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Kazuhide Kumakura (熊倉 一英)
Kazuhide Kumakura (熊倉 一英)
NTT Basic Research Laboratories
Verified email at hco.ntt.co.jp
Title
Cited by
Cited by
Year
Layered boron nitride as a release layer for mechanical transfer of GaN-based devices
Y Kobayashi, K Kumakura, T Akasaka, T Makimoto
Nature 484 (7393), 223-227, 2012
4322012
Minority carrier diffusion length in GaN: Dislocation density and doping concentration dependence
K Kumakura, T Makimoto, N Kobayashi, T Hashizume, T Fukui, ...
Applied Physics Letters 86 (5), 2005
2842005
Mg-acceptor activation mechanism and transport characteristics in p-type InGaN grown by metalorganic vapor phase epitaxy
K Kumakura, T Makimoto, N Kobayashi
Journal of applied physics 93 (6), 3370-3375, 2003
1702003
Activation energy and electrical activity of Mg in Mg-doped InxGa1-xN (x< 0.2)
K Kumakura, T Makimoto, N Kobayashi
Japanese Journal of Applied Physics 39 (4B), L337, 2000
1462000
Al2O3 insulated-gate structure for AlGaN/GaN heterostructure field effect transistors having thin AlGaN barrier layers
T Hashizume, S Anantathanasarn, N Negoro, E Sano, H Hasegawa, ...
Japanese journal of applied physics 43 (6B), L777, 2004
1002004
High current gains obtained by InGaN/GaN double heterojunction bipolar transistors with base
T Makimoto, K Kumakura, N Kobayashi
Applied Physics Letters 79 (3), 380-381, 2001
982001
Increased electrical activity of Mg-acceptors in AlxGa1-xN/GaN superlattices
K Kumakura, N Kobayashi
Japanese journal of applied physics 38 (9A), L1012, 1999
951999
Low-resistance nonalloyed ohmic contact to -type GaN using strained InGaN contact layer
K Kumakura, T Makimoto, N Kobayashi
Applied physics letters 79 (16), 2588-2590, 2001
862001
High-power characteristics of GaN/InGaN double heterojunction bipolar transistors
T Makimoto, Y Yamauchi, K Kumakura
Applied physics letters 84 (11), 1964-1966, 2004
812004
High hole concentrations in Mg-doped InGaN grown by MOVPE
K Kumakura, T Makimoto, N Kobayashi
Journal of crystal growth 221 (1-4), 267-270, 2000
812000
Oxygen ion implantation isolation planar process for AlGaN/GaN HEMTs
JY Shiu, JC Huang, V Desmaris, CT Chang, CY Lu, K Kumakura, ...
IEEE electron device letters 28 (6), 476-478, 2007
722007
Suppression of self-heating effect in AlGaN/GaN high electron mobility transistors by substrate-transfer technology using h-BN
M Hiroki, K Kumakura, Y Kobayashi, T Akasaka, T Makimoto, ...
Applied Physics Letters 105 (19), 2014
662014
High current gain of GaN/InGaN double heterojunction bipolar transistors using base regrowth of
T Makimoto, K Kumakura, N Kobayashi
Applied Physics Letters 83 (5), 1035-1037, 2003
612003
Formation and characterization of coupled quantum dots (CQDs) by selective area metalorganic vapor phase epitaxy
K Kumakura, J Motohisa, T Fukui
Journal of crystal growth 170 (1-4), 700-704, 1997
571997
Novel formation method of quantum dot structures by self-limited selective area metalorganic vapor phase epitaxy
KKK Kumakura, KNK Nakakoshi, JMJ Motohisa, TFT Fukui, ...
Japanese journal of applied physics 34 (8S), 4387, 1995
571995
Efficient Hole Generation above 1019 cm-3 in Mg-Doped InGaN/GaN Superlattices at Room Temperature
K Kumakura, T Makimoto, N Kobayashi
Japanese Journal of Applied Physics 39 (3A), L195, 2000
542000
High hole concentration in Mg-doped AlN/AlGaN superlattices with high Al content
K Ebata, J Nishinaka, Y Taniyasu, K Kumakura
Japanese Journal of Applied Physics 57 (4S), 04FH09, 2018
532018
Enhanced hole generation in Mg-doped AlGaN/GaN superlattices due to piezoelectric field
K Kumakura, T Makimoto, N Kobayashi
Japanese Journal of Applied Physics 39 (4S), 2428, 2000
532000
A vertical InGaN/GaN light-emitting diode fabricated on a flexible substrate by a mechanical transfer method using BN
T Makimoto, K Kumakura, Y Kobayashi, T Akasaka, H Yamamoto
Applied physics express 5 (7), 072102, 2012
492012
Nitride semiconductor stack and its semiconductor device
T Makimoto, K Kumakura, N Kobayashi
US Patent 6,667,498, 2003
482003
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